CHANNELING ION-IMPLANTATION THROUGH PALLADIUM FILMS

被引：3
|
作者：
ISHIWARA, H [1 ]
FURUKAWA, S [1 ]
机构：
[1] TOKYO INST TECHNOL,FAC ENGN,DEPT PHYS ELECTR,MEGUROKU 152,TOKYO,JAPAN
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1975年 / 12卷 / 06期
关键词：
D O I：
10.1116/1.568545
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1374 / 1377
页数：4
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