PRECISE ION-IMPLANTATION ANALYSIS INCLUDING CHANNELING EFFECTS

被引：9
|
作者：
TAKEDA, T [1 ]
TAZAWA, S [1 ]
YOSHII, A [1 ]
机构：
[1] NIPPON TELEGRAPH & TEL PUBL CORP, MUSASHINO ELECT COMMUN LAB, MUSASHINO, TOKYO 180, JAPAN
来源：
IEEE TRANSACTIONS ON ELECTRON DEVICES | 1986年 / 33卷 / 09期
关键词：
D O I：
10.1109/T-ED.1986.22658
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：1278 / 1285
页数：8
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