CHANNELING ION-IMPLANTATION THROUGH PALLADIUM FILMS

被引：3

作者：

ISHIWARA, H ^{[1
]}

FURUKAWA, S ^{[1
]}

机构：

[1] TOKYO INST TECHNOL,FAC ENGN,DEPT PHYS ELECTR,MEGUROKU 152,TOKYO,JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1975年 / 12卷 / 06期

关键词：

D O I：

10.1116/1.568545

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1374 / 1377

页数：4

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