CHARACTERIZATION OF ION-IMPLANTATION DAMAGE USING ELECTRON CHANNELING PATTERNS

被引：0
|
作者：
FARROW, RC [1 ]
JOY, DC [1 ]
机构：
[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974
来源：
JOURNAL OF METALS | 1979年 / 31卷 / 12期
关键词：
D O I：
暂无
中图分类号：
TF [冶金工业];
学科分类号：
0806 ;
摘要：
引用
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页码：83 / 83
页数：1
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