REDISTRIBUTION OF IMPLANTED CHLORINE IN SIO2-FILMS ON SILICON DURING SUBSEQUENT OXIDATION

被引：2

|

作者：

SHEU, YD ^{[1
]}

BUTLER, SR ^{[1
]}

MAGEE, CW ^{[1
]}

机构：

[1] RCA LABS,PRINCETON,NJ 08540

来源：

JOURNAL OF ELECTRONIC MATERIALS | 1986年 / 15卷 / 05期

关键词：

D O I：

10.1007/BF02659020

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：263 / 266

页数：4

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