Design and process variation analysis of CNTFET-based ternary memory cells

被引:35
|
作者
Cho, Geunho [1 ]
Lombardi, Fabrizio [1 ]
机构
[1] Northeastern Univ, Dept Elect & Comp Engn, 360 Huntington Ave, Boston, MA 02115 USA
关键词
CNTFET; Ternary SRAM design; Process variation; TRANSISTORS INCLUDING NONIDEALITIES; COMPACT SPICE MODEL; CIRCUIT PERFORMANCE; SRAM CELL; NANOTUBE; IMMUNE;
D O I
10.1016/j.vlsi.2016.02.003
中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
Two novel ternary CNTFET-based SRAM cells are proposed in this paper. The first proposed CNTFET SRAM uses additional CNTFETs to sink the bit lines to ground; its operation is nearly independent of the ternary values. The second cell utilizes the traditional voltage controller (or supply) of a binary SRAM in a ternary SRAM; it consists of adding two CNTFETs to the first proposed cell. CNTFET features (such as sizing and density) and performance metrics (such as SNM and PDP) and write/read times are considered and assessed in detail. The impact of different features (such as chirality and CNT density) is also analyzed with respect to the operations of the memory cells. The effects of different process variations (such as lithography and density/number of CNTs) are extensively evaluated with respect to performance metrics. In nearly all cases, the proposed cells outperform existing CNTFET-based cells by showing a small standard deviation in the simulated memory circuits. (C) 2016 Elsevier B.V. All rights reserved.
引用
收藏
页码:97 / 108
页数:12
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