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- [21] 1T1C FeRAM Memory Array Based on Ferroelectric HZO With Capacitor Under BitlineIEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY, 2022, 10 : 29 - 34Okuno, Jun论文数: 0 引用数: 0 h-index: 0机构: Sony Semicond Solut Corp, Atsugi, Kanagawa 2430014, Japan Sony Semicond Solut Corp, Atsugi, Kanagawa 2430014, JapanKunihiro, Takafumi论文数: 0 引用数: 0 h-index: 0机构: Sony Semicond Solut Corp, Atsugi, Kanagawa 2430014, Japan Sony Semicond Solut Corp, Atsugi, Kanagawa 2430014, JapanKonishi, Kenta论文数: 0 引用数: 0 h-index: 0机构: Sony Semicond Solut Corp, Atsugi, Kanagawa 2430014, Japan Sony Semicond Solut Corp, Atsugi, Kanagawa 2430014, JapanMaterano, Monica论文数: 0 引用数: 0 h-index: 0机构: NaMLab gGmbH, D-01187 Dresden, Germany Sony Semicond Solut Corp, Atsugi, Kanagawa 2430014, JapanAli, Tarek论文数: 0 引用数: 0 h-index: 0机构: Fraunhofer IPMS, Ctr Nanoelect Technol, D-01099 Dresden, Germany Sony Semicond Solut Corp, Atsugi, Kanagawa 2430014, JapanKuehnel, Kati论文数: 0 引用数: 0 h-index: 0机构: Fraunhofer IPMS, Ctr Nanoelect Technol, D-01099 Dresden, Germany Sony Semicond Solut Corp, Atsugi, Kanagawa 2430014, JapanSeidel, Konrad论文数: 0 引用数: 0 h-index: 0机构: Fraunhofer IPMS, Ctr Nanoelect Technol, D-01099 Dresden, Germany Sony Semicond Solut Corp, Atsugi, Kanagawa 2430014, JapanMikolajick, Thomas论文数: 0 引用数: 0 h-index: 0机构: NaMLab gGmbH, D-01187 Dresden, Germany Tech Univ Dresden, IHM, D-01062 Dresden, Germany Sony Semicond Solut Corp, Atsugi, Kanagawa 2430014, JapanSchroeder, Uwe论文数: 0 引用数: 0 h-index: 0机构: NaMLab gGmbH, D-01187 Dresden, Germany Sony Semicond Solut Corp, Atsugi, Kanagawa 2430014, JapanTsukamoto, Masanori论文数: 0 引用数: 0 h-index: 0机构: Sony Semicond Solut Corp, Atsugi, Kanagawa 2430014, Japan Sony Semicond Solut Corp, Atsugi, Kanagawa 2430014, JapanUmebayashi, Taku论文数: 0 引用数: 0 h-index: 0机构: Sony Semicond Solut Corp, Atsugi, Kanagawa 2430014, Japan Sony Semicond Solut Corp, Atsugi, Kanagawa 2430014, Japan
- [22] 1T1C FeRAM Memory Array Based on Ferroelectric HZO with Capacitor under BitlineIEEE Journal of the Electron Devices Society, 2022, 10 : 29 - 34Okuno, Jun论文数: 0 引用数: 0 h-index: 0机构: Sony Semiconductor Solutions Corporation, Atsugi,243-0014, Japan Sony Semiconductor Solutions Corporation, Atsugi,243-0014, JapanKunihiro, Takafumi论文数: 0 引用数: 0 h-index: 0机构: Sony Semiconductor Solutions Corporation, Atsugi,243-0014, Japan Sony Semiconductor Solutions Corporation, Atsugi,243-0014, JapanKonishi, Kenta论文数: 0 引用数: 0 h-index: 0机构: Sony Semiconductor Solutions Corporation, Atsugi,243-0014, Japan Sony Semiconductor Solutions Corporation, Atsugi,243-0014, JapanMaterano, Monica论文数: 0 引用数: 0 h-index: 0机构: NaMLab GGmbH, Dresden,01187, Germany Sony Semiconductor Solutions Corporation, Atsugi,243-0014, JapanAli, Tarek论文数: 0 引用数: 0 h-index: 0机构: Center Nanoelectronics Technologies, Fraunhofer Ipms, Dresden,01099, Germany Sony Semiconductor Solutions Corporation, Atsugi,243-0014, JapanKuehnel, Kati论文数: 0 引用数: 0 h-index: 0机构: Center Nanoelectronics Technologies, Fraunhofer Ipms, Dresden,01099, Germany Sony Semiconductor Solutions Corporation, Atsugi,243-0014, JapanSeidel, Konrad论文数: 0 引用数: 0 h-index: 0机构: Center Nanoelectronics Technologies, Fraunhofer Ipms, Dresden,01099, Germany Sony Semiconductor Solutions Corporation, Atsugi,243-0014, JapanMikolajick, Thomas论文数: 0 引用数: 0 h-index: 0机构: NaMLab GGmbH, Dresden,01187, Germany Ihm, Tu Dresden, Dresden,01062, Germany Sony Semiconductor Solutions Corporation, Atsugi,243-0014, JapanSchroeder, Uwe论文数: 0 引用数: 0 h-index: 0机构: NaMLab GGmbH, Dresden,01187, Germany Sony Semiconductor Solutions Corporation, Atsugi,243-0014, JapanTsukamoto, Masanori论文数: 0 引用数: 0 h-index: 0机构: Sony Semiconductor Solutions Corporation, Atsugi,243-0014, Japan Sony Semiconductor Solutions Corporation, Atsugi,243-0014, JapanUmebayashi, Taku论文数: 0 引用数: 0 h-index: 0机构: Sony Semiconductor Solutions Corporation, Atsugi,243-0014, Japan Sony Semiconductor Solutions Corporation, Atsugi,243-0014, Japan
- [23] Enhanced polarization and endurance properties of ZrO2-based ferroelectric capacitor using HfO2 interfacial layerNANOTECHNOLOGY, 2024, 35 (43)Zhang, Wei论文数: 0 引用数: 0 h-index: 0机构: Hebei Univ, Coll Phys Sci & Technol, Hebei Key Lab Photoelect Informat & Mat, Baoding 071002, Peoples R China Hebei Univ, Coll Phys Sci & Technol, Hebei Key Lab Photoelect Informat & Mat, Baoding 071002, Peoples R ChinaShi, Yuxuan论文数: 0 引用数: 0 h-index: 0机构: Hebei Univ, Coll Phys Sci & Technol, Hebei Key Lab Photoelect Informat & Mat, Baoding 071002, Peoples R China Hebei Univ, Coll Phys Sci & Technol, Hebei Key Lab Photoelect Informat & Mat, Baoding 071002, Peoples R ChinaZhang, Bowen论文数: 0 引用数: 0 h-index: 0机构: Hebei Univ, Coll Phys Sci & Technol, Hebei Key Lab Photoelect Informat & Mat, Baoding 071002, Peoples R China Hebei Univ, Coll Phys Sci & Technol, Hebei Key Lab Photoelect Informat & Mat, Baoding 071002, Peoples R ChinaLiu, Zengqiang论文数: 0 引用数: 0 h-index: 0机构: Hebei Univ, Coll Phys Sci & Technol, Hebei Key Lab Photoelect Informat & Mat, Baoding 071002, Peoples R China Hebei Univ, Coll Phys Sci & Technol, Hebei Key Lab Photoelect Informat & Mat, Baoding 071002, Peoples R ChinaCao, Yating论文数: 0 引用数: 0 h-index: 0机构: Hebei Univ, Coll Phys Sci & Technol, Hebei Key Lab Photoelect Informat & Mat, Baoding 071002, Peoples R China Hebei Univ, Coll Phys Sci & Technol, Hebei Key Lab Photoelect Informat & Mat, Baoding 071002, Peoples R ChinaPan, Ting论文数: 0 引用数: 0 h-index: 0机构: Hebei Univ, Coll Phys Sci & Technol, Hebei Key Lab Photoelect Informat & Mat, Baoding 071002, Peoples R China Hebei Univ, Coll Phys Sci & Technol, Hebei Key Lab Photoelect Informat & Mat, Baoding 071002, Peoples R ChinaLi, Yubao论文数: 0 引用数: 0 h-index: 0机构: Hebei Univ, Coll Phys Sci & Technol, Hebei Key Lab Photoelect Informat & Mat, Baoding 071002, Peoples R China Hebei Univ, Coll Phys Sci & Technol, Hebei Key Lab Photoelect Informat & Mat, Baoding 071002, Peoples R China
- [24] A Novel Hafnia-based Ferroelectric Capacitor with Antiferroelectric Zirconia Seed Layer for High Ferroelectricity and Endurance8TH IEEE ELECTRON DEVICES TECHNOLOGY & MANUFACTURING CONFERENCE, EDTM 2024, 2024, : 76 - 78Yang, Mengxuan论文数: 0 引用数: 0 h-index: 0机构: Peking Univ, Sch Integrated Circuits, Beijing 100871, Peoples R China Peking Univ, Sch Integrated Circuits, Beijing 100871, Peoples R ChinaWang, Kaifeng论文数: 0 引用数: 0 h-index: 0机构: Peking Univ, Sch Integrated Circuits, Beijing 100871, Peoples R China Peking Univ, Sch Integrated Circuits, Beijing 100871, Peoples R ChinaYu, Bocheng论文数: 0 引用数: 0 h-index: 0机构: Peking Univ, Sch Integrated Circuits, Beijing 100871, Peoples R China Peking Univ, Sch Integrated Circuits, Beijing 100871, Peoples R ChinaFu, Zhiyuan论文数: 0 引用数: 0 h-index: 0机构: Peking Univ, Sch Integrated Circuits, Beijing 100871, Peoples R China Peking Univ, Sch Integrated Circuits, Beijing 100871, Peoples R ChinaSu, Chang论文数: 0 引用数: 0 h-index: 0机构: Peking Univ, Sch Integrated Circuits, Beijing 100871, Peoples R China Peking Univ, Sch Integrated Circuits, Beijing 100871, Peoples R ChinaHuang, Ru论文数: 0 引用数: 0 h-index: 0机构: Peking Univ, Sch Integrated Circuits, Beijing 100871, Peoples R China Beijing Adv Innovat Ctr Integrated Circuits, Beijing 100871, Peoples R China Peking Univ, Sch Integrated Circuits, Beijing 100871, Peoples R ChinaHuang, Qianqian论文数: 0 引用数: 0 h-index: 0机构: Peking Univ, Sch Integrated Circuits, Beijing 100871, Peoples R China Beijing Adv Innovat Ctr Integrated Circuits, Beijing 100871, Peoples R China Beijing Superstring Acad Memory Technol, Beijing 100176, Peoples R China Peking Univ, Sch Integrated Circuits, Beijing 100871, Peoples R China
- [25] Improved Endurance of Hf0.5Zr0.5O2-Based Ferroelectric Capacitor Through Optimizing the Ti-N Ratio in TiN ElectrodeIEEE ELECTRON DEVICE LETTERS, 2022, 43 (04) : 561 - 564Dang, Zhiwei论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Inst Microelect, Key Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R China Univ Chinese Acad Sci, Beijing 100049, Peoples R China Chinese Acad Sci, Inst Microelect, Key Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R ChinaLv, Shuxian论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Inst Microelect, Key Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R China Univ Chinese Acad Sci, Beijing 100049, Peoples R China Chinese Acad Sci, Inst Microelect, Key Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R ChinaGao, Zhaomeng论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Inst Microelect, Key Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R China Univ Chinese Acad Sci, Beijing 100049, Peoples R China Chinese Acad Sci, Inst Microelect, Key Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R ChinaChen, Meiwen论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Inst Microelect, Key Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R China Univ Chinese Acad Sci, Beijing 100049, Peoples R China Chinese Acad Sci, Inst Microelect, Key Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R ChinaXu, Yannan论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Inst Microelect, Key Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R China Univ Chinese Acad Sci, Beijing 100049, Peoples R China Chinese Acad Sci, Inst Microelect, Key Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R ChinaJiang, Pengfei论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Inst Microelect, Key Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R China Univ Chinese Acad Sci, Beijing 100049, Peoples R China Chinese Acad Sci, Inst Microelect, Key Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R ChinaDing, Yaxin论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Inst Microelect, Key Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R China Univ Chinese Acad Sci, Beijing 100049, Peoples R China Chinese Acad Sci, Inst Microelect, Key Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R ChinaYuan, Peng论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Inst Microelect, Key Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R China Univ Chinese Acad Sci, Beijing 100049, Peoples R China Chinese Acad Sci, Inst Microelect, Key Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R ChinaWang, Yuan论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Inst Microelect, Key Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R China Univ Chinese Acad Sci, Beijing 100049, Peoples R China Chinese Acad Sci, Inst Microelect, Key Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R ChinaChen, Yuting论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Inst Microelect, Key Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R China Univ Chinese Acad Sci, Beijing 100049, Peoples R China Chinese Acad Sci, Inst Microelect, Key Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R ChinaLuo, Qing论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Inst Microelect, Key Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R China Peng Cheng Lab, Dept Math & Theories, Shenzhen 518052, Peoples R China Chinese Acad Sci, Inst Microelect, Key Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R ChinaWang, Yan论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Inst Microelect, Key Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R China Peng Cheng Lab, Dept Math & Theories, Shenzhen 518052, Peoples R China Chinese Acad Sci, Inst Microelect, Key Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R China
- [26] A 9-Mb HZO-Based Embedded FeRAM With 1012-Cycle Endurance and 5/7-ns Read/Write Using ECC-Assisted Data Refresh and Offset-Canceled Sense AmplifierIEEE JOURNAL OF SOLID-STATE CIRCUITS, 2024, 59 (01) : 208 - 218Wu, Qiqiao论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Inst Microelect, Beijing 100017, Peoples R China Fudan Univ, Frontier Inst Chip & Syst, Shanghai 200437, Peoples R China Chinese Acad Sci, Inst Microelect, Beijing 100017, Peoples R ChinaCao, Yue论文数: 0 引用数: 0 h-index: 0机构: Zhangjiang Lab, Shanghai 201210, Peoples R China Chinese Acad Sci, Inst Microelect, Beijing 100017, Peoples R ChinaLuo, Qing论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Inst Microelect, Beijing 100017, Peoples R China Fudan Univ, Frontier Inst Chip & Syst, Shanghai 200437, Peoples R China Chinese Acad Sci, Lab Microelect Devices & Integrated Technol, Inst Microelect, Beijing 100017, Peoples R China Univ Chinese Acad Sci, Sch Microelect, Beijing 101408, Peoples R China Chinese Acad Sci, Inst Microelect, Beijing 100017, Peoples R ChinaJiang, Haijun论文数: 0 引用数: 0 h-index: 0机构: Zhangjiang Lab, Shanghai 201210, Peoples R China Chinese Acad Sci, Inst Microelect, Beijing 100017, Peoples R ChinaHan, Zhongze论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Lab Microelect Devices & Integrated Technol, Inst Microelect, Beijing 100017, Peoples R China Univ Chinese Acad Sci, Sch Microelect, Beijing 101408, Peoples R China Chinese Acad Sci, Inst Microelect, Beijing 100017, Peoples R ChinaHan, Yongkang论文数: 0 引用数: 0 h-index: 0机构: Zhangjiang Lab, Shanghai 201210, Peoples R China Chinese Acad Sci, Inst Microelect, Beijing 100017, Peoples R ChinaDou, Chunmeng论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Lab Microelect Devices & Integrated Technol, Inst Microelect, Beijing 100017, Peoples R China Univ Chinese Acad Sci, Sch Microelect, Beijing 101408, Peoples R China Chinese Acad Sci, Inst Microelect, Beijing 100017, Peoples R ChinaLv, Hangbing论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Lab Microelect Devices & Integrated Technol, Inst Microelect, Beijing 100017, Peoples R China Univ Chinese Acad Sci, Sch Microelect, Beijing 101408, Peoples R China Chinese Acad Sci, Inst Microelect, Beijing 100017, Peoples R ChinaLiu, Qi论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Inst Microelect, Beijing 100017, Peoples R ChinaYang, Jianguo论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Lab Microelect Devices & Integrated Technol, Inst Microelect, Beijing 100017, Peoples R China Univ Chinese Acad Sci, Sch Microelect, Beijing 101408, Peoples R China Chinese Acad Sci, Inst Microelect, Beijing 100017, Peoples R ChinaLiu, Ming论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Inst Microelect, Beijing 100017, Peoples R China Fudan Univ, Frontier Inst Chip & Syst, Shanghai 200437, Peoples R China Chinese Acad Sci, Inst Microelect, Beijing 100017, Peoples R China
- [27] Fabrication of Ru/Bi4-xLaxTi3O12/Ru ferroelectric capacitor structure using a Ru film deposited by metalorganic chemical vapor depositionFERROELECTRIC THIN FILMS XII, 2004, 784 : 195 - 200Furukawa, T论文数: 0 引用数: 0 h-index: 0机构: R&D Assoc Future Electron Devices, Midori Ku, Yokohama, Kanagawa 2268503, Japan R&D Assoc Future Electron Devices, Midori Ku, Yokohama, Kanagawa 2268503, JapanKuroiwa, T论文数: 0 引用数: 0 h-index: 0机构: R&D Assoc Future Electron Devices, Midori Ku, Yokohama, Kanagawa 2268503, Japan R&D Assoc Future Electron Devices, Midori Ku, Yokohama, Kanagawa 2268503, JapanFujisaki, Y论文数: 0 引用数: 0 h-index: 0机构: R&D Assoc Future Electron Devices, Midori Ku, Yokohama, Kanagawa 2268503, Japan R&D Assoc Future Electron Devices, Midori Ku, Yokohama, Kanagawa 2268503, JapanSato, T论文数: 0 引用数: 0 h-index: 0机构: R&D Assoc Future Electron Devices, Midori Ku, Yokohama, Kanagawa 2268503, Japan R&D Assoc Future Electron Devices, Midori Ku, Yokohama, Kanagawa 2268503, JapanIshiwara, H论文数: 0 引用数: 0 h-index: 0机构: R&D Assoc Future Electron Devices, Midori Ku, Yokohama, Kanagawa 2268503, Japan R&D Assoc Future Electron Devices, Midori Ku, Yokohama, Kanagawa 2268503, Japan
- [28] Improvement of contact resistance between Ru electrode and TiN barrier in Ru/crystalline-Ta2O5/Ru capacitor for 50 nm dynamic random access memoryJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2005, 44 (4B): : 2225 - 2229Lim, HJ论文数: 0 引用数: 0 h-index: 0机构: Samsung Elect Co Ltd, Proc Dev Team, Memory Div, Semicond Business, Yongin 449900, Kyungki, South Korea Samsung Elect Co Ltd, Proc Dev Team, Memory Div, Semicond Business, Yongin 449900, Kyungki, South KoreaChung, SJ论文数: 0 引用数: 0 h-index: 0机构: Samsung Elect Co Ltd, Proc Dev Team, Memory Div, Semicond Business, Yongin 449900, Kyungki, South Korea Samsung Elect Co Ltd, Proc Dev Team, Memory Div, Semicond Business, Yongin 449900, Kyungki, South KoreaLee, KH论文数: 0 引用数: 0 h-index: 0机构: Samsung Elect Co Ltd, Proc Dev Team, Memory Div, Semicond Business, Yongin 449900, Kyungki, South Korea Samsung Elect Co Ltd, Proc Dev Team, Memory Div, Semicond Business, Yongin 449900, Kyungki, South KoreaLee, J论文数: 0 引用数: 0 h-index: 0机构: Samsung Elect Co Ltd, Proc Dev Team, Memory Div, Semicond Business, Yongin 449900, Kyungki, South Korea Samsung Elect Co Ltd, Proc Dev Team, Memory Div, Semicond Business, Yongin 449900, Kyungki, South KoreaKtm, JY论文数: 0 引用数: 0 h-index: 0机构: Samsung Elect Co Ltd, Proc Dev Team, Memory Div, Semicond Business, Yongin 449900, Kyungki, South Korea Samsung Elect Co Ltd, Proc Dev Team, Memory Div, Semicond Business, Yongin 449900, Kyungki, South KoreaYoo, CY论文数: 0 引用数: 0 h-index: 0机构: Samsung Elect Co Ltd, Proc Dev Team, Memory Div, Semicond Business, Yongin 449900, Kyungki, South Korea Samsung Elect Co Ltd, Proc Dev Team, Memory Div, Semicond Business, Yongin 449900, Kyungki, South KoreaKim, ST论文数: 0 引用数: 0 h-index: 0机构: Samsung Elect Co Ltd, Proc Dev Team, Memory Div, Semicond Business, Yongin 449900, Kyungki, South Korea Samsung Elect Co Ltd, Proc Dev Team, Memory Div, Semicond Business, Yongin 449900, Kyungki, South KoreaChung, UI论文数: 0 引用数: 0 h-index: 0机构: Samsung Elect Co Ltd, Proc Dev Team, Memory Div, Semicond Business, Yongin 449900, Kyungki, South Korea Samsung Elect Co Ltd, Proc Dev Team, Memory Div, Semicond Business, Yongin 449900, Kyungki, South KoreaMoon, JT论文数: 0 引用数: 0 h-index: 0机构: Samsung Elect Co Ltd, Proc Dev Team, Memory Div, Semicond Business, Yongin 449900, Kyungki, South Korea Samsung Elect Co Ltd, Proc Dev Team, Memory Div, Semicond Business, Yongin 449900, Kyungki, South Korea
- [29] Extendibility of Ta2O5 metal-insulator-metal capacitor using Ru electrodeJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2000, 39 (4B): : 2073 - 2077Tsuzumitani, A论文数: 0 引用数: 0 h-index: 0机构: Matsushita Elect Corp, ULSI Proc Technol Dev Ctr, Semicond Co, Minami Ku, Kyoto 6018413, Japan Matsushita Elect Corp, ULSI Proc Technol Dev Ctr, Semicond Co, Minami Ku, Kyoto 6018413, JapanOkuno, Y论文数: 0 引用数: 0 h-index: 0机构: Matsushita Elect Corp, ULSI Proc Technol Dev Ctr, Semicond Co, Minami Ku, Kyoto 6018413, Japan Matsushita Elect Corp, ULSI Proc Technol Dev Ctr, Semicond Co, Minami Ku, Kyoto 6018413, JapanShibata, J论文数: 0 引用数: 0 h-index: 0机构: Matsushita Elect Corp, ULSI Proc Technol Dev Ctr, Semicond Co, Minami Ku, Kyoto 6018413, Japan Matsushita Elect Corp, ULSI Proc Technol Dev Ctr, Semicond Co, Minami Ku, Kyoto 6018413, JapanShimizu, T论文数: 0 引用数: 0 h-index: 0机构: Matsushita Elect Corp, ULSI Proc Technol Dev Ctr, Semicond Co, Minami Ku, Kyoto 6018413, Japan Matsushita Elect Corp, ULSI Proc Technol Dev Ctr, Semicond Co, Minami Ku, Kyoto 6018413, JapanYamamoto, K论文数: 0 引用数: 0 h-index: 0机构: Matsushita Elect Corp, ULSI Proc Technol Dev Ctr, Semicond Co, Minami Ku, Kyoto 6018413, Japan Matsushita Elect Corp, ULSI Proc Technol Dev Ctr, Semicond Co, Minami Ku, Kyoto 6018413, JapanMori, Y论文数: 0 引用数: 0 h-index: 0机构: Matsushita Elect Corp, ULSI Proc Technol Dev Ctr, Semicond Co, Minami Ku, Kyoto 6018413, Japan Matsushita Elect Corp, ULSI Proc Technol Dev Ctr, Semicond Co, Minami Ku, Kyoto 6018413, Japan
- [30] Extendibility of Ta2O5 metal-insulator-metal capacitor using Ru electrode2000, JJAP, Tokyo, Japan (39):Tsuzumitani, Akihiko论文数: 0 引用数: 0 h-index: 0机构: ULSI Proc. Technol. Devmt. Center, Semiconductor Company, Matsushita Electronics Corporation, 19 Nishikujo-kasugacho, Minami-ku, Kyoto 601-8413, Japan ULSI Proc. Technol. Devmt. Center, Semiconductor Company, Matsushita Electronics Corporation, 19 Nishikujo-kasugacho, Minami-ku, Kyoto 601-8413, JapanOkuno, Yasutoshi论文数: 0 引用数: 0 h-index: 0机构: ULSI Proc. Technol. Devmt. Center, Semiconductor Company, Matsushita Electronics Corporation, 19 Nishikujo-kasugacho, Minami-ku, Kyoto 601-8413, Japan ULSI Proc. Technol. Devmt. Center, Semiconductor Company, Matsushita Electronics Corporation, 19 Nishikujo-kasugacho, Minami-ku, Kyoto 601-8413, JapanShibata, Jun论文数: 0 引用数: 0 h-index: 0机构: ULSI Proc. Technol. Devmt. Center, Semiconductor Company, Matsushita Electronics Corporation, 19 Nishikujo-kasugacho, Minami-ku, Kyoto 601-8413, Japan ULSI Proc. Technol. Devmt. Center, Semiconductor Company, Matsushita Electronics Corporation, 19 Nishikujo-kasugacho, Minami-ku, Kyoto 601-8413, JapanShimizu, Tadami论文数: 0 引用数: 0 h-index: 0机构: ULSI Proc. Technol. Devmt. Center, Semiconductor Company, Matsushita Electronics Corporation, 19 Nishikujo-kasugacho, Minami-ku, Kyoto 601-8413, Japan ULSI Proc. Technol. Devmt. Center, Semiconductor Company, Matsushita Electronics Corporation, 19 Nishikujo-kasugacho, Minami-ku, Kyoto 601-8413, JapanYamamoto, Kazuhiko论文数: 0 引用数: 0 h-index: 0机构: ULSI Proc. Technol. Devmt. Center, Semiconductor Company, Matsushita Electronics Corporation, 19 Nishikujo-kasugacho, Minami-ku, Kyoto 601-8413, Japan ULSI Proc. Technol. Devmt. Center, Semiconductor Company, Matsushita Electronics Corporation, 19 Nishikujo-kasugacho, Minami-ku, Kyoto 601-8413, JapanMori, Yoshihiro论文数: 0 引用数: 0 h-index: 0机构: ULSI Proc. Technol. Devmt. Center, Semiconductor Company, Matsushita Electronics Corporation, 19 Nishikujo-kasugacho, Minami-ku, Kyoto 601-8413, Japan ULSI Proc. Technol. Devmt. Center, Semiconductor Company, Matsushita Electronics Corporation, 19 Nishikujo-kasugacho, Minami-ku, Kyoto 601-8413, Japan