Fault Models for Logic Circuits in the Multigate Era

被引:24
|
作者
Bhoj, Ajay N. [1 ]
Simsir, Muzaffer O. [1 ]
Jha, Niraj K. [1 ]
机构
[1] Princeton Univ, Dept Elect Engn, Princeton, NJ 08544 USA
关键词
Device simulation; fault models; FinFETs; independent-gate structure; leakage; shorted-gate structure; CMOS;
D O I
10.1109/TNANO.2011.2169807
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
With increased scaling to lower technology nodes, the electrostatic integrity of planar FETs is expected to worsen, necessitating the adoption of low-leakage high-performance multigate FETs, amongst which the FinFET is very attractive with respect to fabrication process complexity. A significant void from a circuit testing viewpoint is the absence of fault models for FinFETs. In particular, it is unclear if CMOS fault models are comprehensive enough to model all defects in FinFET circuits. We investigate the aforementioned problem using mixed-mode FinFET device simulation and demonstrate that while faults defined for planar FETs show significant overlaps with FinFETs, they do not encompass all regimes of operation. Results indicate that no single fault model can adequately capture the leakage-delay behavior of logic gates based on independent-gate FinFETs with opens on the back gate, and shorted-gate FinFETs, which have been accidentally etched into independent-gate structures. To this effect, we categorize back-gate cuts into three regimes where either pulse broadening or pulse shrinking occurs, which can be tested using three-/two-pattern delay fault tests.
引用
收藏
页码:182 / 193
页数:12
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