Deep X-ray lithography beamline at ELETTRA

被引：25
|
作者：
Pérennés, F
De Bona, F
Pantenburg, FJ
机构：
[1] Sincrotrone Trieste, Soc Consoirtile P Azioni, Microfabricat Grp, I-34012 Trieste, Italy
[2] Univ Udine, I-33100 Udine, Italy
[3] Forschungszentrum Karlsruhe, Inst Mikrostrukturtech, D-76021 Karlsruhe, Germany
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT | 2001年 / 467卷
关键词：
deep X-ray lithography; beam-stop;
D O I：
10.1016/S0168-9002(01)00632-5
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
A Deep X-Ray Lithography (DXRL) beamline was just commissioned at ELETTRA in Trieste, the Italian third generation synchrotron light source whose features make it well adapted to the DXRL process. A general description of the beamline is given with an emphasis on the reduction of the effect of secondary emission using a high energy filter based on an horizontal beam-stop. Finally the first fabricated microstructures are presented. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：1274 / 1278
页数：5
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