LILIT beamline for soft and deep X-ray lithography at Elettra

被引：24
|
作者：
Romanato, F
Di Fabrizio, E
Vaccari, L
Altissimo, M
Cojoc, D
Businaro, L
Cabrini, S
机构：
[1] Elettra Synchrotron Light Source SS, TASC, INFM, I-34012 Trieste, Italy
[2] Ist Elettron Stato Solido, I-00156 Rome, Italy
[3] Politechn Univ Bucharest, TEF, Dept Optoelect Grp, Bucharest, Romania
来源：
MICROELECTRONIC ENGINEERING | 2001年 / 57-8卷
关键词：
D O I：
10.1016/S0167-9317(01)00534-2
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
In this paper we present the beamline for X-ray lithography installed at ELETTRA (Trieste, Italy). The peculiarity of the beamline design consists mainly in its wide lithographic window. This is achieved by combining high-pass filters (Beryllium windows or other suitable material filters) with low-pass filters (mirrors at increasing angles of incidence). The design allows to change the spectral range of interest continuously, from the soft (around 1.5 keV) where we can achieve the highest lithographic resolution, to hard X-ray region (higher than 10 keV) where sensitive materials of thickness of tens of microns can be exposed. (C) 2001 Elsevier Science BY All rights reserved.
引用
收藏
页码：101 / 107
页数：7
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