Deep X-ray lithography at ELETTRA using a central beam-stop to enhance adhesion

被引:0
|
作者
F. Pérennès
E. Vesselli
F. J. Pantenburg
机构
[1] Sincrotrone Trieste,
[2] in Area Science Park S.S. 14,undefined
[3] Km 163,undefined
[4] 5,undefined
[5] I-34012 Trieste,undefined
[6] Italy E-mail: perennesf@elettra.trieste.it,undefined
[7] Forschungzentrum Karlsruhe,undefined
[8] Institut für Mikrostrukturtechnik Postfach 3640,undefined
[9] 6D-76021 Karlsruhe,undefined
[10] Germany,undefined
来源
关键词
Radiation; Energy Photon; Spectral Distribution; Radiation Spectrum; Radiation Process;
D O I
暂无
中图分类号
学科分类号
摘要
 In the deep X-ray lithography process adhesion of resist structures on metallic coated substrate is strongly correlated with the spectral distribution of the radiation. At ELETTRA the bending magnet radiation spectrum extends up to 20 keV which can severely increase the secondary radiation process from the metal coated resist substrate, especially when the deep lithography process is used for mask replication involving lower resist and absorber thicknesses. To reduce the proportion of high energy photons in the radiation spectrum the central part of the beam is blocked by a beam-stop acting as a low energy band-pass filter. The results of the first expositions at ELETTRA using different size beam-stops are presented and discussed.
引用
收藏
页码:330 / 334
页数:4
相关论文
共 50 条
  • [1] Deep X-ray lithography at ELETTRA using a central beam-stop to enhance adhesion
    Pérennès, F
    Vesselli, E
    Pantenburg, FJ
    [J]. MICROSYSTEM TECHNOLOGIES, 2002, 8 (4-5) : 330 - 334
  • [2] Adhesion improvement in the deep X-ray lithography process using a central beam-stop
    Pérennès, F
    Pantenburg, FJ
    [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2001, 174 (03): : 317 - 323
  • [3] Deep X-ray lithography beamline at ELETTRA
    Pérennés, F
    De Bona, F
    Pantenburg, FJ
    [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 2001, 467 : 1274 - 1278
  • [4] LILIT beamline for soft and deep X-ray lithography at Elettra
    Romanato, F
    Di Fabrizio, E
    Vaccari, L
    Altissimo, M
    Cojoc, D
    Businaro, L
    Cabrini, S
    [J]. MICROELECTRONIC ENGINEERING, 2001, 57-8 : 101 - 107
  • [5] Enhanced adhesion buffer layer for deep x-ray lithography using hard x rays
    De Carlo, F
    Song, JJ
    Mancini, DC
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (06): : 3539 - 3542
  • [6] X-ray lenses fabricated by deep x-ray lithography
    Mancini, DC
    Moldovan, N
    Divan, R
    DeCarlo, F
    Yaeger, J
    [J]. DESIGN AND MICROFABRICATION OF NOVEL X-RAY OPTICS, 2002, 4783 : 28 - 36
  • [7] X-Ray masks for very deep X-Ray lithography
    J. Klein
    H. Guckel
    D. P. Siddons
    E. D. Johnson
    [J]. Microsystem Technologies, 1998, 4 : 70 - 73
  • [8] X-Ray masks for very deep X-Ray lithography
    Klein, J
    Guckel, H
    Siddons, DP
    Johnson, ED
    [J]. MICROSYSTEM TECHNOLOGIES, 1998, 4 (02) : 70 - 73
  • [9] Comparison between beam-stop and beam-hole array scatter correction techniques for industrial X-ray cone-beam CT
    Schoerner, K.
    Goldammer, M.
    Stephan, J.
    [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2011, 269 (03): : 292 - 299
  • [10] Fabrication of x-ray absorption gratings via deep x-ray lithography using a conventional x-ray tube
    Pinzek, Simon
    Beckenbach, Thomas
    Viermetz, Manuel
    Meyer, Pascal
    Gustschin, Alex
    Andrejewski, Jana
    Gustschin, Nikolai
    Herzen, Julia
    Schulz, Joachim
    Pfeiffer, Franz
    [J]. JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, 2021, 20 (04):