Meso-scale simulation of the polymer dynamics in the formation process of line-edge roughness

被引:6
|
作者
Morita, Hiroshi [1 ]
Doi, Masao [2 ]
机构
[1] Natl Inst Adv Ind Sci & Technol, Nanotechnol Rsearch Inst, Central2-1,1-1-1 Umezono, Tsukuba, Ibaraki 3058568, Japan
[2] Univ Tokyo, Tokyo 1138654, Japan
关键词
line edge roughness; dissipative particle dynamics simulation; OCTA; dynamics of polymer chain; Surface; DISSIPATIVE PARTICLE DYNAMICS;
D O I
10.1117/12.814017
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We studied the formation process of the line edge using meso scale simulations based on the dissipative particle dynamics method. The simulation model of the lithographic process is developed in which the dynamics of a polymer chain can be observed. We perform three kinds of simulations; 1) whole area exposure simulation, 2) line pattern simulation, 3) the simulation including the line edge. From our results, a sharp and a homogeneous interface between soluble and insoluble polymers is best solution to LER problem, although its roughness is the size of the chain dimension. The roughened edge can be found in the case of a wide and a homogeneous interface. These results indicate that our simulations can be applicable to study the LER problem and the dynamics of polymer chain will be one of the important origins of LER.
引用
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页数:8
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