Resist blur and line-edge roughness

被引：0
|
作者：
Gallatin, GM [1 ]
机构：
[1] Appl Math Solut LLC, Newtown, CT 06470 USA
来源：
MICROLITHOGRAPHY WORLD | 2005年 / 14卷 / 03期
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D O I：
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中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
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页码：4 / +
页数：4
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