共 50 条
- [41] THE ROLE OF BOTTOM MESO-SCALE DYNAMICS IN CONTOURITE FORMATION IN THE ARGENTINE BASIN [J]. Journal of Sedimentary Research, 94 (05): : 527 - 540
- [43] Photoresist process simulation to study line edge roughness [J]. OPTICAL AND EUV NANOLITHOGRAPHY XXXVII, 2024, 12953
- [44] Measurement of sidewall, line and line-edge roughness with scanning probe microscopy [J]. METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XV, 2001, 4344 : 726 - 732
- [45] MESO-SCALE INVESTIGATION OF A SQUALL-LINE [J]. METEOROLOGICAL MAGAZINE, 1966, 95 (1131): : 304 - &
- [46] Photoresist line-edge roughness analysis using scaling concepts [J]. JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS, 2004, 3 (03): : 429 - 435
- [47] Simulation of the combined effects of polymer size, acid diffusion length and EUV secondary electron blur on resist line-edge roughness [J]. ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXIV, 2007, 6519
- [48] System-level impact of interconnect line-edge roughness [J]. 2018 IEEE INTERNATIONAL INTERCONNECT TECHNOLOGY CONFERENCE (IITC), 2018, : 67 - 69
- [50] Level crossing methodology applied to line-edge roughness characterization [J]. METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXI, 2017, 10145