Meso-scale simulation of the line-edge structure based on polymer chains in the developing and rinse process

被引:2
|
作者
Morita, Hiroshi [1 ]
Doi, Masao [2 ]
机构
[1] Natl Inst Adv Ind Sci & Technol, Nanotechnol Rsearch Inst, Central2-1 1-1-1 Umezono, Tsukuba, Ibaraki 3058568, Japan
[2] Univ Tokyo, Dept Appl Phys, Tokyo 1138656, Japan
关键词
line edge roughness; dissipative particle dynamics simulation; OCTA; dynamics of polymer chain; Surface;
D O I
10.1117/12.846526
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
To study the line edge roughness, we developed the simulation method of formation process of line edge based on the meso-scale simulation of dissipative particle dynamics (DPD) method. We modeled the development and rinse processes based on the coarse-grained polymer model. It is important that the block copolymer in which the soluble and insoluble blocks are bonded exists at the line edge. Though the soluble part of this block copolymer is stretched out in the developing process, it becomes shrunk in the rinse process. The shrunk polymers contribute to the formation of line edge, and LER was much influenced by these polymers. These simulations will represent the formation process of line edge based on the polymer chain dynamics.
引用
收藏
页数:9
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