The light collected from inductively coupled CH4/N-2 and N-2 plasmas is strongly affected by wall reflection. Since wall reflectivity varies with wavelength, the effect can lead to a significant error in the electron temperature determined by the line-ratio method. (C) 2005 American Institute of Physics.
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St Petersburg State Univ, St Petersburg 199034, RussiaSt Petersburg State Univ, St Petersburg 199034, Russia
Bogdanov, E. A.
Eliseev, S. I.
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St Petersburg State Univ, St Petersburg 199034, Russia
ITMO Univ, St Petersburg 197101, RussiaSt Petersburg State Univ, St Petersburg 199034, Russia
Eliseev, S. I.
Kudryavtsev, A. A.
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St Petersburg State Univ, St Petersburg 199034, Russia
ITMO Univ, St Petersburg 197101, RussiaSt Petersburg State Univ, St Petersburg 199034, Russia
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Univ Maryland, Dept Mat Sci & Engn, College Pk, MD 20740 USA
Univ Maryland, Inst Res & Appl Phys, College Pk, MD 20740 USAUniv Maryland, Dept Mat Sci & Engn, College Pk, MD 20740 USA
Fox-Lyon, N.
Knoll, A. J.
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Univ Maryland, Dept Mat Sci & Engn, College Pk, MD 20740 USA
Univ Maryland, Inst Res & Appl Phys, College Pk, MD 20740 USAUniv Maryland, Dept Mat Sci & Engn, College Pk, MD 20740 USA
Knoll, A. J.
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Franek, J.
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Demidov, V.
Godyak, V.
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Univ Michigan, Dept Elect Engn & Comp Sci, Ann Arbor, MI 48109 USAUniv Maryland, Dept Mat Sci & Engn, College Pk, MD 20740 USA
Godyak, V.
Koepke, M.
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W Virginia Univ, Dept Phys, Morgantown, WV 26506 USAUniv Maryland, Dept Mat Sci & Engn, College Pk, MD 20740 USA
Koepke, M.
Oehrlein, G. S.
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Univ Maryland, Dept Mat Sci & Engn, College Pk, MD 20740 USA
Univ Maryland, Inst Res & Appl Phys, College Pk, MD 20740 USAUniv Maryland, Dept Mat Sci & Engn, College Pk, MD 20740 USA
机构:
Hanyang Univ, Dept Elect Engn, 17 Haengdang Dong, Seoul 133791, South KoreaHanyang Univ, Dept Nanoscale Semicond Engn, 17 Haengdang Dong, Seoul 133791, South Korea
Kim, Tae-Woo
Kim, Kyung-Hyun
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Hanyang Univ, Dept Elect Engn, 17 Haengdang Dong, Seoul 133791, South KoreaHanyang Univ, Dept Nanoscale Semicond Engn, 17 Haengdang Dong, Seoul 133791, South Korea
Kim, Kyung-Hyun
Kwon, Deuk-Chul
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Natl Fus Res Inst, Plasma Technol Res Ctr, 37 Dongjangsan Ro, Jeonbuk 54004, South KoreaHanyang Univ, Dept Nanoscale Semicond Engn, 17 Haengdang Dong, Seoul 133791, South Korea
Kwon, Deuk-Chul
Chung, Chin-Wook
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Hanyang Univ, Dept Elect Engn, 17 Haengdang Dong, Seoul 133791, South KoreaHanyang Univ, Dept Nanoscale Semicond Engn, 17 Haengdang Dong, Seoul 133791, South Korea
机构:
Natl Fus Res Inst, Plasma Technol Res Ctr, Gunsan 54004, Jeonbuk, South KoreaNatl Fus Res Inst, Plasma Technol Res Ctr, Gunsan 54004, Jeonbuk, South Korea
Kwon, Deuk-Chul
Yu, Dong-Hun
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Kwongwon Tech Co Ltd, Seongnam 13497, Geonggi, South Korea
Jeongbuk Natl Univ, Jeonju 54896, Jeonbuk, South KoreaNatl Fus Res Inst, Plasma Technol Res Ctr, Gunsan 54004, Jeonbuk, South Korea
Yu, Dong-Hun
Kwon, Hyoungcheol
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SK Hynix Inc, Icheon 17336, Geonggi, South KoreaNatl Fus Res Inst, Plasma Technol Res Ctr, Gunsan 54004, Jeonbuk, South Korea
Kwon, Hyoungcheol
Im, Yeon Ho
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Jeongbuk Natl Univ, Jeonju 54896, Jeonbuk, South Korea
SK Hynix Inc, Icheon 17336, Geonggi, South KoreaNatl Fus Res Inst, Plasma Technol Res Ctr, Gunsan 54004, Jeonbuk, South Korea
Im, Yeon Ho
Lee, Hyo-Chang
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Korea Res Inst Stand & Sci, Adv Instrumentat Inst, Daejeon 34114, South KoreaNatl Fus Res Inst, Plasma Technol Res Ctr, Gunsan 54004, Jeonbuk, South Korea