Effect of wall reflection on the determination of electron temperature by the line-ratio method in inductively coupled plasmas

被引:4
|
作者
Pu, YK [1 ]
Yu, ZD [1 ]
Guo, ZG [1 ]
机构
[1] Tsinghua Univ, Dept Engn Phys, Beijing 100084, Peoples R China
基金
中国国家自然科学基金;
关键词
D O I
10.1063/1.2124527
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
The light collected from inductively coupled CH4/N-2 and N-2 plasmas is strongly affected by wall reflection. Since wall reflectivity varies with wavelength, the effect can lead to a significant error in the electron temperature determined by the line-ratio method. (C) 2005 American Institute of Physics.
引用
收藏
页码:1 / 3
页数:3
相关论文
共 50 条
  • [41] Comment on "Effect of the electron energy distribution on total energy loss with argon in inductively coupled plasmas" [Phys. Plasmas 22, 013501 (2015)]
    Bogdanov, E. A.
    Eliseev, S. I.
    Kudryavtsev, A. A.
    PHYSICS OF PLASMAS, 2015, 22 (04)
  • [42] Determination of Ar metastable atom densities in Ar and Ar/H2 inductively coupled low-temperature plasmas
    Fox-Lyon, N.
    Knoll, A. J.
    Franek, J.
    Demidov, V.
    Godyak, V.
    Koepke, M.
    Oehrlein, G. S.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2013, 46 (48)
  • [43] A novel method of using the OES line ratio to determine the spatially resolved atomic density in low-temperature plasmas and its application in carbon and aluminium atoms in capacitively coupled plasmas
    Li, Jiang
    Zhu, Xi-Ming
    Pu, Yi-Kang
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2011, 44 (45)
  • [44] The opposite pressure dependence of electron temperature with respect to O2/Ar mixing ratio in an inductively coupled plasma
    Lee, Moo-Young
    Jung, Jiwon
    Kim, Tae-Woo
    Kim, Kyung-Hyun
    Kwon, Deuk-Chul
    Chung, Chin-Wook
    PHYSICS OF PLASMAS, 2020, 27 (11)
  • [45] Response to "Comment on 'Effect of the electron energy distribution on total energy loss with argon in inductively coupled plasmas'" [Phys. Plasmas 22, 044701 (2015)]
    Kim, June Young
    Kim, Young-Cheol
    Kim, Yu-Sin
    Chung, Chin-Wook
    PHYSICS OF PLASMAS, 2015, 22 (04)
  • [46] Effect of pulsation on the determination of temperature with the method of absolute line intensity
    Thoukvatoulline, R
    Feldmann, G
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2000, 33 (19) : 2420 - 2424
  • [47] Determination of the Electron Temperature of Atmospheric Pressure Argon Plasmas by Absolute Line Intensities and a Collisional Radiative Model
    Taghizadeh, Leila
    Nikiforov, Anton
    Morent, Rino
    van der Mullen, Joost
    Leys, Christophe
    PLASMA PROCESSES AND POLYMERS, 2014, 11 (08) : 777 - 786
  • [48] Global model for pulsed inductively coupled plasma sources: Effect of edge-to-center density ratio and electron heating
    Kwon, Deuk-Chul
    Yu, Dong-Hun
    Kwon, Hyoungcheol
    Im, Yeon Ho
    Lee, Hyo-Chang
    PHYSICS OF PLASMAS, 2020, 27 (07)
  • [49] On-line method for inductively coupled plasma mass spectrometric determination of rare earth elements in highly saline brines
    Halicz, L
    Gavrieli, I
    Dorfman, E
    JOURNAL OF ANALYTICAL ATOMIC SPECTROMETRY, 1996, 11 (09) : 811 - 814
  • [50] Wall heating effect on crystallization of low-temperature deposited silicon films from an inductively-coupled plasma
    Kojima, T
    Ohishi, A
    Toyoda, H
    Goto, M
    Nishitani, M
    Sugai, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2001, 40 (01): : 322 - 325