Effect of wall reflection on the determination of electron temperature by the line-ratio method in inductively coupled plasmas

被引:4
|
作者
Pu, YK [1 ]
Yu, ZD [1 ]
Guo, ZG [1 ]
机构
[1] Tsinghua Univ, Dept Engn Phys, Beijing 100084, Peoples R China
基金
中国国家自然科学基金;
关键词
D O I
10.1063/1.2124527
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
The light collected from inductively coupled CH4/N-2 and N-2 plasmas is strongly affected by wall reflection. Since wall reflectivity varies with wavelength, the effect can lead to a significant error in the electron temperature determined by the line-ratio method. (C) 2005 American Institute of Physics.
引用
收藏
页码:1 / 3
页数:3
相关论文
共 50 条
  • [31] Determination of electron temperature from spectral line intensity decay for radiation dominated plasmas
    Michael, CA
    Howard, J
    REVIEW OF SCIENTIFIC INSTRUMENTS, 2004, 75 (10): : 4180 - 4182
  • [32] Validation of x-ray line ratios for electron temperature determination in tokamak plasmas
    Rosen, A. S.
    Reinke, M. L.
    Rice, J. E.
    Hubbard, A. E.
    Hughes, J. W.
    JOURNAL OF PHYSICS B-ATOMIC MOLECULAR AND OPTICAL PHYSICS, 2014, 47 (10)
  • [33] Comparison of electron density measurements in planar inductively coupled plasmas by means of the plasma oscillation method and Langmuir probes
    Schwabedissen, A
    Benck, EC
    Roberts, JR
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 1998, 7 (02): : 119 - 129
  • [34] The Stark-crossing method for the simultaneous determination of the electron temperature and density in plasmas
    Torres, J.
    Carabano, O.
    Fernandez, M.
    Rubio, S.
    Alvarez, R.
    Rodero, A.
    Lao, C.
    Quintero, M. C.
    Gamero, A.
    Sola, A.
    FIRST INTERNATIONAL WORKSHOP AND SUMMER SCHOOL ON PLASMA PHYSICS, 2006, 44 : 70 - +
  • [36] Radial distributions of ion velocity, temperature, and density in ultrahigh-frequency, inductively coupled, and electron cyclotron resonance plasmas
    Nakano, T
    Samukawa, S
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1998, 16 (04): : 2065 - 2072
  • [37] Analysis of uncertainty in measurement of electron temperature in low-pressure inductively coupled plasmas using microwave cutoff probe
    Yeom, Hee-Jung
    Chae, Gwang-Seok
    Kim, Jung-Hyung
    Lee, Hyo-Chang
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2024, 33 (11):
  • [38] Measurement of the temporal evolution of electron density in a nanosecond pulsed argon microplasma: using both Stark broadening and an OES line-ratio method
    Zhu, Xi-Ming
    Walsh, James L.
    Chen, Wen-Cong
    Pu, Yi-Kang
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2012, 45 (29)
  • [39] ELECTRON-TEMPERATURE MEASUREMENT IN LASER-PRODUCED PLASMAS BY THE RATIO OF ISOELECTRONIC LINE-INTENSITIES
    MARJORIBANKS, RS
    RICHARDSON, MC
    JAANIMAGI, PA
    EPSTEIN, R
    PHYSICAL REVIEW A, 1992, 46 (04): : R1747 - R1750
  • [40] Fabrication of the Mg/Si alloy films for determination of electron temperature of plasmas by isoelectronic line ratios
    Xu, Hua
    Wu, Wei-Dong
    Chen, Zhi-Mei
    Tang, Xiao-Hong
    Huang, Yong
    Tang, Yong-Jian
    Yuanzineng Kexue Jishu/Atomic Energy Science and Technology, 2002, 36 (4-5): : 371 - 373