PULSED ELECTRON-BEAM ANNEALING OF ION-IMPLANTED GAAS

被引：0
|
作者：
VAIDYANATHAN, KV
ANDERSON, CL
BARRETT, B
DUNLAP, HL
HESS, LD
GOLECKI, I
NICOLET, MA
机构：
[1] HUGHES RES LABS,MALIBU,CA 90265
[2] CALTECH,PASADENA,CA 91125
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1979年 / 126卷 / 08期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：C361 / C362
页数：2
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