DIFFUSION OF PHOSPHORUS INTO SILICON THROUGH AN OXIDE LAYER

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作者：

KAHNG, D

THURSTON, MO

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JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1959年 / 106卷 / 08期

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O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

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页码：C208 / C208

页数：1

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