ION-IMPLANTATION OF SULFUR AND SILICON IN GAAS

被引：0
|
作者：
LIU, SG
DOUGLAS, EC
WU, CP
MAGEE, CW
NARAYAN, SY
JOLLY, ST
KOLONDRA, F
JAIN, S
机构：
来源：
RCA REVIEW | 1980年 / 41卷 / 02期
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D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
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页码：227 / 262
页数：36
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