HYDROGEN IN OXIDIZED SILICON OXYNITRIDE THIN-FILMS

被引：4
|
作者：
ELFERINK, JBO [1 ]
HABRAKEN, FHPM [1 ]
VANDERWEG, WF [1 ]
KUIPER, AET [1 ]
机构：
[1] PHILIPS RES LABS,5600 JA EINDHOVEN,NETHERLANDS
来源：
APPLIED SURFACE SCIENCE | 1988年 / 33-4卷
关键词：
D O I：
10.1016/0169-4332(88)90378-9
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
引用
收藏
页码：765 / 772
页数：8
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