CHARACTERIZATION OF PECVD DEPOSITED SILICON OXYNITRIDE THIN-FILMS

被引：5
|
作者：
SPEAKMAN, SP
READ, PM
KIERMASZ, A
机构：
[1] EEV CHELMSFORD,DIV SOLID STATE DEVICES,ESSEX,ENGLAND
[2] HARWELL LAB,NUCL PHYS DIV,DIDCOT,OXON,ENGLAND
[3] THORNBURY LABS,SPECIAL RES SYST,BRISTOL,ENGLAND
来源：
VACUUM | 1988年 / 38卷 / 03期
关键词：
D O I：
10.1016/0042-207X(88)90176-5
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：183 / 188
页数：6
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