PROCESSING AND CHARACTERIZATION OF CHEMICAL VAPOR-DEPOSITED THIN SILICON OXYNITRIDE FILMS

被引：0

作者：

BHATTACHARYYA, A ^{[1
]}

KROLL, CT ^{[1
]}

VELASQUEZ, PC ^{[1
]}

机构：

[1] IBM CORP,DIV SYST PROD,ESSEX JUNCTION,VT 05452

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1976年 / 123卷 / 08期

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：C270 / C270

页数：1

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