OXIDATION OF PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITED SILICON-NITRIDE AND OXYNITRIDE FILMS

被引：11
|
作者：
DENISSE, CMM
SMULDERS, HE
HABRAKEN, FHPM
VANDERWEG, WF
机构：
来源：
APPLIED SURFACE SCIENCE | 1989年 / 39卷 / 1-4期
关键词：
D O I：
10.1016/0169-4332(89)90417-0
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
引用
收藏
页码：25 / 32
页数：8
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