FUNDAMENTAL ASPECTS OF ELECTRON-BEAM LITHOGRAPHY .1. DEPTH-DOSE RESPONSE OF POLYMERIC ELECTRON-BEAM RESISTS

被引：60
|
作者：
HEIDENREICH, RD [1 ]
THOMPSON, LF [1 ]
FEIT, ED [1 ]
MELLIARS.CM [1 ]
机构：
[1] BELL LABS, MURRAY HILL, NJ 07974 USA
来源：
JOURNAL OF APPLIED PHYSICS | 1973年 / 44卷 / 09期
关键词：
D O I：
10.1063/1.1662892
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：4039 / 4047
页数：9
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