FUNDAMENTAL ASPECTS OF ELECTRON-BEAM LITHOGRAPHY .1. DEPTH-DOSE RESPONSE OF POLYMERIC ELECTRON-BEAM RESISTS

被引：60

作者：

HEIDENREICH, RD ^{[1
]}

THOMPSON, LF ^{[1
]}

FEIT, ED ^{[1
]}

MELLIARS.CM ^{[1
]}

机构：

[1] BELL LABS, MURRAY HILL, NJ 07974 USA

来源：

关键词：

D O I：

10.1063/1.1662892

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4039 / 4047

页数：9

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