FUNDAMENTAL ASPECTS OF ELECTRON-BEAM LITHOGRAPHY .1. DEPTH-DOSE RESPONSE OF POLYMERIC ELECTRON-BEAM RESISTS

被引：60
|
作者：
HEIDENREICH, RD [1 ]
THOMPSON, LF [1 ]
FEIT, ED [1 ]
MELLIARS.CM [1 ]
机构：
[1] BELL LABS, MURRAY HILL, NJ 07974 USA
来源：
JOURNAL OF APPLIED PHYSICS | 1973年 / 44卷 / 09期
关键词：
D O I：
10.1063/1.1662892
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：4039 / 4047
页数：9
相关论文
共 50 条
  • [21] Dose contribution of heating in electron-beam lithography
    Svintsov, AA
    Zaitsev, SI
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (06): : 2550 - 2552
  • [22] Molecular resists based on cholate derivatives for electron-beam lithography
    Shiono, Daiju
    Hirayama, Taku
    Hada, Hideo
    Onodera, Junichi
    Arai, Tadashi
    Yamaguchi, Atsuko
    Kojima, Kyoko
    Shiraishi, Hiroshi
    Fukuda, Hiroshi
    ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XXIII, PTS 1 AND 2, 2006, 6153 : U1010 - U1016
  • [23] VARIABLE DEVELOPMENT RESPONSE OF RESISTS USING ELECTRON-BEAM LITHOGRAPHY - METHODS AND APPLICATIONS
    HENDERSON, RC
    PEASE, RFW
    POLYMER ENGINEERING AND SCIENCE, 1974, 14 (07): : 538 - 541
  • [24] ELECTRON-BEAM INSTRUMENTS AND ELECTRON LITHOGRAPHY
    VASICHEV, BN
    SOVIET JOURNAL OF OPTICAL TECHNOLOGY, 1982, 49 (12): : 778 - 785
  • [25] Amorphous chalcogenide semiconductor resists for holography and electron-beam lithography
    Teteris, J
    Kuzmina, I
    OPTICAL ORGANIC AND INORGANIC MATERIALS, 2001, 4415 : 54 - 59
  • [26] Molecular resists based on cholate derivatives for electron-beam lithography
    Shiono, Daiju
    Hirayama, Taku
    Kasai, Kohei
    Hada, Hideo
    Onodera, Junichi
    Arai, Tadashi
    Yamaguchi, Atsuko
    Shiraishi, Hiroshi
    Fukuda, Hiroshi
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (6B): : 5435 - 5439
  • [27] Amorphous chalcogenide semiconductor resists for holography and electron-beam lithography
    Teteris, J
    Jaaskelainen, T
    Turunen, J
    Jefimov, K
    PHOTONICS, DEVICES,AND SYSTEMS, 2000, 4016 : 217 - 221
  • [28] Positive resists for electron-beam and X-ray lithography
    Bulgakova, SA
    Mazanova, LM
    Semchikov, YD
    Lopatin, AY
    Luchin, VI
    Salashchenko, NN
    APEIE-98: 1998 4TH INTERNATIONAL CONFERENCE ON ACTUAL PROBLEMS OF ELECTRONIC INSTRUMENT ENGINEERING PROCEEDINGS, VOL 1, 1998, : 81 - 82
  • [29] Protonation sites in chemically amplified resists for electron-beam lithography
    Natsuda, Kenichiro
    Kozawa, Takahiro
    Okamoto, Kazumasa
    Tagawa, Seiichi
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2006, 45 (46-50): : L1256 - L1258
  • [30] Molecular resists based on cholate derivatives for electron-beam lithography
    Shiono, Daiju
    Hirayama, Taku
    Kasai, Kohei
    Hada, Hideo
    Onodera, Junichi
    Arai, Tadashi
    Yamaguchi, Atsuko
    Shiraishi, Hiroshi
    Fukuda, Hiroshi
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2006, 45 (6 B): : 5435 - 5439
12345