Molecular resists based on cholate derivatives for electron-beam lithography

被引：0
|
作者：
Shiono, Daiju [1 ]
Hirayama, Taku [1 ]
Kasai, Kohei [1 ]
Hada, Hideo [1 ]
Onodera, Junichi [1 ]
Arai, Tadashi [2 ]
Yamaguchi, Atsuko [2 ]
Shiraishi, Hiroshi [2 ]
Fukuda, Hiroshi [2 ]
机构：
[1] New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd., 1590 Tabata, Samukawa-machi, Koza-gun, Kanagawa 253-0114, Japan
[2] ULSI Research Department, Central Research Laboratory, Hitachi, Ltd., 1-280, Higashi-koigakubo, Kokubunji, Tokyo 185-8601, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2006年 / 45卷 / 6 B期
关键词：
Electron beam lithography;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Journal article (JA)
引用
收藏
页码：5435 / 5439
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