ELECTRON-BEAM LITHOGRAPHY - INFLUENCE OF MOLECULAR CHARACTERISTICS ON THE PERFORMANCE OF POSITIVE RESISTS

被引:8
|
作者
SHARMA, VK [1 ]
AFFROSSMAN, S [1 ]
PETHRICK, RA [1 ]
机构
[1] UNIV STRATHCLYDE,DEPT PURE & APPL CHEM,THOMAS GRAHAM BLDG,295 CATHEDRAL ST,GLASGOW G1 1XL,SCOTLAND
来源
BRITISH POLYMER JOURNAL | 1984年 / 16卷 / 02期
关键词
D O I
10.1002/pi.4980160205
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
引用
收藏
页码:73 / 76
页数:4
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