ELECTRON-BEAM LITHOGRAPHY - INFLUENCE OF MOLECULAR CHARACTERISTICS ON THE PERFORMANCE OF POSITIVE RESISTS

被引：8
|
作者：
SHARMA, VK [1 ]
AFFROSSMAN, S [1 ]
PETHRICK, RA [1 ]
机构：
[1] UNIV STRATHCLYDE,DEPT PURE & APPL CHEM,THOMAS GRAHAM BLDG,295 CATHEDRAL ST,GLASGOW G1 1XL,SCOTLAND
来源：
BRITISH POLYMER JOURNAL | 1984年 / 16卷 / 02期
关键词：
D O I：
10.1002/pi.4980160205
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
引用
收藏
页码：73 / 76
页数：4
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