RESISTS FOR ELECTRON-BEAM LITHOGRAPHY

被引：0
|
作者：
TAMAMURA, T [1 ]
IMAMURA, S [1 ]
SUGAWARA, S [1 ]
机构：
[1] NIPPON TELEGRAPH & TEL PUBL CORP,IBARAKI ELECT COMMUN LABS,TOKAI,IBARAKI 31911,JAPAN
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1983年 / 185卷 / MAR期
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D O I：
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中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
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页码：32 / ORPL
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