AN EFFICIENT DIFFUSION ALGORITHM FOR 2-D VLSI PROCESS MODELING CODE

被引：0
|
作者：
STEFANOV, EN [1 ]
ASENOV, AM [1 ]
机构：
[1] INST MICROELECTR,DEPT PROC & DEVICE MODELING,BU-1784 SOFIA,BULGARIA
来源：
COMPEL-THE INTERNATIONAL JOURNAL FOR COMPUTATION AND MATHEMATICS IN ELECTRICAL AND ELECTRONIC ENGINEERING | 1990年 / 9卷 / 04期
关键词：
D O I：
10.1108/eb010078
中图分类号：
TP39 [计算机的应用];
学科分类号：
081203 ; 0835 ;
摘要：
The coupled set of non-linear 2-D diffusion equations for donor and acceptor type impurities with initial and appropriated boundary conditions is solved by an implicit locally-one dimensional finite difference method. Numerical experiments have been made to achieve a reasonable trade-off between the desired accuracy and the CPU time. The algorithm was implemented to the process module of the 2-D integrated process and device modeling system IMPEDANCE 2.0.
引用
收藏
页码：229 / 245
页数：17
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