AN EFFICIENT DIFFUSION ALGORITHM FOR 2-D VLSI PROCESS MODELING CODE

被引：0

作者：

STEFANOV, EN ^{[1
]}

ASENOV, AM ^{[1
]}

机构：

[1] INST MICROELECTR,DEPT PROC & DEVICE MODELING,BU-1784 SOFIA,BULGARIA

来源：

COMPEL-THE INTERNATIONAL JOURNAL FOR COMPUTATION AND MATHEMATICS IN ELECTRICAL AND ELECTRONIC ENGINEERING | 1990年 / 9卷 / 04期

关键词：

D O I：

10.1108/eb010078

中图分类号：

TP39 [计算机的应用];

学科分类号：

081203 ; 0835 ;

摘要：

The coupled set of non-linear 2-D diffusion equations for donor and acceptor type impurities with initial and appropriated boundary conditions is solved by an implicit locally-one dimensional finite difference method. Numerical experiments have been made to achieve a reasonable trade-off between the desired accuracy and the CPU time. The algorithm was implemented to the process module of the 2-D integrated process and device modeling system IMPEDANCE 2.0.

引用

页码：229 / 245

页数：17

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