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- [21] HYDROGEN PLASMA-ETCHING OF AMORPHOUS AND MICROCRYSTALLINE SILICONELECTRONICS LETTERS, 1987, 23 (18) : 967 - 968VANOORT, RCGEERTS, MJVANDENHEUVEL, JCMETSELAAR, JW
- [22] DEEP AND FAST PLASMA-ETCHING FOR SILICON MICROMACHININGSENSORS AND ACTUATORS A-PHYSICAL, 1995, 46 (1-3) : 17 - 21FRANCOU, MDANEL, JSPECCOUD, L
- [23] CONTAMINATION OF SILICON AND OXIDIZED SILICON WAFERS DURING PLASMA-ETCHINGJOURNAL OF ELECTRONIC MATERIALS, 1979, 8 (05) : 727 - 727MURARKA, SPMOGAB, CJ
- [24] CONTAMINATION OF SILICON AND OXIDIZED SILICON WAFERS DURING PLASMA-ETCHINGJOURNAL OF ELECTRONIC MATERIALS, 1979, 8 (06) : 763 - 779MURARKA, SPMOGAB, CJ
- [25] HIGH-TEMPERATURE PLASMA-ETCHING OF SILICON AND SILICON DIOXIDEJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (03) : C81 - C81CHIU, KCRSNOW, WR
- [26] LARGE-AREA MICROWAVE PLASMA-ETCHING OF POLYIMIDEJOURNAL OF PHYSICS D-APPLIED PHYSICS, 1987, 20 (07) : 844 - 850LAMONTAGNE, BWROBEL, AMJALBERT, GWERTHEIMER, MR
- [27] PLASMA-ETCHING IN MAGNETIC MULTIPOLE MICROWAVE-DISCHARGEAPPLIED PHYSICS LETTERS, 1984, 45 (02) : 132 - 134ARNAL, YPELLETIER, JPOMOT, CPETIT, BDURANDET, A
- [29] THE GASES OF PLASMA-ETCHING - SILICON-BASED TECHNOLOGYSOLID STATE TECHNOLOGY, 1985, 28 (03) : 123 - 127MUCHA, JA
- [30] A MODEL FOR THE HALOGEN-BASED PLASMA-ETCHING OF SILICONJOURNAL OF PHYSICS D-APPLIED PHYSICS, 1987, 20 (07) : 858 - 869PELLETIER, J