PLASMA-ETCHING

被引：0

作者：

MUCHA, JA ^{[1
]}

HESS, DW ^{[1
]}

机构：

[1] UNIV CALIF BERKELEY,DEPT CHEM ENGN,BERKELEY,CA 94720

来源：

ACS SYMPOSIUM SERIES | 1983年 / 219卷

关键词：

D O I：

暂无

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：215 / 285

页数：71

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