LOW-RESISTIVITY INDIUM TIN OXIDE-FILMS BY PULSED-LASER DEPOSITION

被引：119
|
作者：
ZHENG, JP [1 ]
KWOK, HS [1 ]
机构：
[1] SUNY Buffalo, DEPT ELECT & COMP ENGN, BUFFALO, NY 14260 USA
来源：
APPLIED PHYSICS LETTERS | 1993年 / 63卷 / 01期
关键词：
D O I：
10.1063/1.109736
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Indium tin oxide films were grown by pulsed laser deposition on glass substrates. The electrical and optical properties of these films were studied. At optimized oxygen pressures, films with resistivity values of 1.4 X 10(-4) and 5.6 X 10(-4) OMEGA cm were deposited at substrate temperatures of 310 and 20-degrees-C, respectively. Films with a thickness of 180 nm had a transmission of nearly 100% for the wavelength range of 600-800 nm.
引用
收藏
页码：1 / 3
页数：3
相关论文
共 50 条
  • [41] INDIUM TIN OXIDE-FILMS BY SEQUENTIAL EVAPORATION
    YAO, JL
    HAO, S
    WILKINSON, JS
    THIN SOLID FILMS, 1990, 189 (02) : 227 - 233
  • [42] DEPOSITION OF INDIUM TIN OXIDE-FILMS ON ACRYLIC SUBSTRATES BY RADIOFREQUENCY MAGNETRON SPUTTERING
    CHIOU, BS
    HSIEH, ST
    WU, WF
    JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1994, 77 (07) : 1740 - 1744
  • [43] THE EFFECT OF GAS ATMOSPHERES ON RESISTIVITY OF INDIUM TIN OXIDE-FILMS AT HIGH-TEMPERATURE
    ADACHI, K
    HIRAYAMA, T
    SAKATA, H
    JOURNAL OF MATERIALS SCIENCE, 1990, 25 (2B) : 1403 - 1406
  • [44] PROPERTIES OF INDIUM TIN OXIDE-FILMS PREPARED BY ION-ASSISTED DEPOSITION
    MARTIN, PJ
    NETTERFIELD, RP
    MCKENZIE, DR
    THIN SOLID FILMS, 1986, 137 (02) : 207 - 214
  • [45] Electrical and optical properties of indium tin oxide thin films grown by pulsed laser deposition
    H. Kim
    J.S. Horwitz
    A. Piqué
    C.M. Gilmore
    D.B. Chrisey
    Applied Physics A, 1999, 69 : S447 - S450
  • [46] Electrical and optical properties of indium tin oxide thin films grown by pulsed laser deposition
    Kim, H
    Horwitz, JS
    Piqué, A
    Gilmore, CM
    Chrisey, DB
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1999, 69 (Suppl 1): : S447 - S450
  • [47] Highly conducting indium tin oxide films grown by ultraviolet-assisted pulsed laser deposition at low temperatures
    Craciun, V
    Craciun, D
    Wang, X
    Anderson, TJ
    Singh, RK
    THIN SOLID FILMS, 2004, 453 : 256 - 261
  • [48] INFLUENCE OF POST-DEPOSITION ANNEALING ON THE INDIUM TIN OXIDE THIN FILMS GROWN BY PULSED LASER DEPOSITION
    Mustapha, N.
    Alakhras, A.
    Idriss, H.
    DIGEST JOURNAL OF NANOMATERIALS AND BIOSTRUCTURES, 2020, 15 (04) : 1227 - 1237
  • [49] Indium tin oxide thin films grown on polyethersulphone (PES) substrates by pulsed-laser deposition for use in organic light-emitting diodes
    Kim, KH
    Park, NM
    Kim, TY
    Cho, KS
    Lee, JI
    Chu, HY
    Sung, GY
    ETRI JOURNAL, 2005, 27 (04) : 405 - 410
  • [50] Pulsed Laser Deposition of Nanostructured Indium-Tin-Oxide Film
    Yong, Thian Kok
    Nee, Chen Hon
    Yap, Seong Shan
    Siew, Wee Ong
    Safran, Gyoergy
    Yap, Yoke Kin
    Tou, Teck Yong
    NANOSTRUCTURED THIN FILMS III, 2010, 7766
12345