LOW-RESISTIVITY INDIUM TIN OXIDE-FILMS BY PULSED-LASER DEPOSITION

被引：119
|
作者：
ZHENG, JP [1 ]
KWOK, HS [1 ]
机构：
[1] SUNY Buffalo, DEPT ELECT & COMP ENGN, BUFFALO, NY 14260 USA
来源：
APPLIED PHYSICS LETTERS | 1993年 / 63卷 / 01期
关键词：
D O I：
10.1063/1.109736
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Indium tin oxide films were grown by pulsed laser deposition on glass substrates. The electrical and optical properties of these films were studied. At optimized oxygen pressures, films with resistivity values of 1.4 X 10(-4) and 5.6 X 10(-4) OMEGA cm were deposited at substrate temperatures of 310 and 20-degrees-C, respectively. Films with a thickness of 180 nm had a transmission of nearly 100% for the wavelength range of 600-800 nm.
引用
收藏
页码：1 / 3
页数：3
相关论文
共 50 条
  • [21] Low temperature growth of smooth indium tin oxide films by ultraviolet assisted pulsed laser deposition
    Craciun, V
    Chiritescu, C
    Kelly, F
    Singh, RK
    JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 2002, 4 (01): : 21 - 25
  • [22] Transparent and conducting indium tin oxide thin films grown by pulsed laser deposition at low temperatures
    Craciun, V
    Craciun, D
    Wang, X
    Anderson, TJ
    Singh, RK
    JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 2003, 5 (02): : 401 - 408
  • [23] Low-Resistivity Indium-Tin-Oxide Transparent Conducting Films: Dependence of Carrier Electron Concentration on Tin Concentration
    Sawada, Yutaka
    Seki, Shigeyuki
    Uchida, Takayuki
    Hoshi, Yoichi
    Wang, Mei-Han
    Lei, Hao
    Sun, Li-Xian
    PROCEEDINGS OF THE 2015 INTERNATIONAL CONFERENCE ON MATERIAL SCIENCE AND APPLICATIONS (ICMSA 2015), 2015, 3 : 719 - 722
  • [24] CHARACTERIZATION OF INDIUM TIN OXIDE-FILMS
    MURALI, KR
    SAMBASIVAM, V
    JAYACHANDRAN, M
    CHOCKALINGAM, MJ
    RANGARAJAN, N
    VENKATESAN, VK
    SURFACE & COATINGS TECHNOLOGY, 1988, 35 (1-2): : 207 - 213
  • [25] CVD OF INDIUM TIN OXIDE-FILMS
    RANADIVE, DK
    SMITH, FTJ
    KHOSLA, RP
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (08) : C299 - C299
  • [26] Optimization of Sputtering Parameters for the Deposition of Low Resistivity Indium Tin Oxide Thin Films
    Yasrebi, Navid
    Bagheri, Behrang
    Yazdanfar, Payam
    Rashidian, Bizhan
    Sasanpour, Pezhman
    ACTA METALLURGICA SINICA-ENGLISH LETTERS, 2014, 27 (02) : 324 - 330
  • [27] Optimization of Sputtering Parameters for the Deposition of Low Resistivity Indium Tin Oxide Thin Films
    Navid Yasrebi
    Behrang Bagheri
    Payam Yazdanfar
    Bizhan Rashidian
    Pezhman Sasanpour
    ActaMetallurgicaSinica(EnglishLetters), 2014, 27 (02) : 324 - 330
  • [28] Optimization of Sputtering Parameters for the Deposition of Low Resistivity Indium Tin Oxide Thin Films
    Navid Yasrebi
    Behrang Bagheri
    Payam Yazdanfar
    Bizhan Rashidian
    Pezhman Sasanpour
    Acta Metallurgica Sinica (English Letters), 2014, 27 : 324 - 330
  • [29] Effect of laser irradiation on the properties of indium tin oxide films deposited by pulsed laser deposition
    Adurodija, FO
    Izumi, H
    Ishihara, T
    Yoshioka, H
    Motoyama, M
    Murai, K
    APPLIED SURFACE SCIENCE, 2001, 177 (1-2) : 114 - 121
  • [30] DEPOSITION OF TRANSPARENT CONDUCTING INDIUM TIN OXIDE-FILMS BY DC SPUTTERING
    BAWA, SS
    SHARMA, SS
    AGNIHOTRY, SA
    BIRADAR, AM
    CHANDRA, S
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1983, 428 : 22 - 28
12345