共 50 条
- [1] REACTIVE DC HIGH-RATE SPUTTERING WITH THE MAGNETRON-PLASMATRON FOR INDUSTRIAL APPLICATIONS [J]. VAKUUM-TECHNIK, 1981, 30 (01): : 3 - 14
- [7] Pulsed dc magnetron discharge for high-rate sputtering of thin films [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2001, 19 (02): : 420 - 424
- [9] LOW-REFRACTIVE-INDEX INDIUM TIN OXYFLUORIDE THIN-FILMS MADE BY HIGH-RATE REACTIVE DC MAGNETRON SPUTTERING [J]. APPLIED OPTICS, 1988, 27 (14): : 2847 - 2850
- [10] PROPERTIES OF SUPERCONDUCTING ZRN THIN-FILMS DEPOSITED BY DC REACTIVE MAGNETRON SPUTTERING [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1987, 26 (05): : L570 - L572