共 16 条
- [2] COPPER-BASED MATERIALS FORMED BY HIGH-RATE SPUTTERING [J]. THIN SOLID FILMS, 1977, 47 (03) : 291 - 306
- [3] REACTIVE DC HIGH-RATE SPUTTERING WITH THE MAGNETRON-PLASMATRON FOR INDUSTRIAL APPLICATIONS [J]. VAKUUM-TECHNIK, 1981, 30 (01): : 3 - 14
- [5] COPPER-BASE MATERIALS FORMED BY HIGH-RATE SPUTTERING [J]. THIN SOLID FILMS, 1977, 45 (02) : 386 - 386
- [6] ELECTRON-BEAM EVAPORATION AND HIGH-RATE SPUTTERING WITH PLASMATRON - MAGNETRON SYSTEMS - COMPARISON [J]. VAKUUM-TECHNIK, 1978, 27 (02): : 51 - 55
- [7] Effect of the structure of the fatigue resistance of dispersion-strengthened copper-based condensates I. Experimental dependences [J]. Powder Metallurgy and Metal Ceramics, 1998, 37 : 210 - 216
- [9] ELECTRON-BEAM EVAPORATION AND HIGH-RATE SPUTTERING WITH PLASMATRON-MAGNETRON SYSTEMS - COMPARISON .2. [J]. VAKUUM-TECHNIK, 1978, 27 (03): : 75 - 86