ELECTRON-BEAM EVAPORATION AND HIGH-RATE SPUTTERING WITH PLASMATRON-MAGNETRON SYSTEMS - COMPARISON .2.

被引：0
|
作者：
SCHILLER, S
HEISIG, U
GOEDICKE, K
机构：
来源：
VAKUUM-TECHNIK | 1978年 / 27卷 / 03期
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暂无
中图分类号：
TH [机械、仪表工业];
学科分类号：
0802 ;
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页码：75 / 86
页数：12
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