HIGH-RATE ELECTRON-BEAM EVAPORATION FOR ROLL COATING

被引：0

作者：

SCHILLER, S

NEUMANN, M

机构：

[1] Forschungsinstitut Manfred von, Ardenne, Dresden, East Ger, Forschungsinstitut Manfred von Ardenne, Dresden, East Ger

来源：

VAKUUM-TECHNIK | 1985年 / 34卷 / 04期

关键词：

D O I：

暂无

中图分类号：

TH [机械、仪表工业];

学科分类号：

0802 ;

摘要：

引用

页码：99 / 109

页数：11

共 50 条

[1] HIGH-RATE ELECTRON-BEAM EVAPORATION
SCHILLER, S
JAESCH, G
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[J]. THIN SOLID FILMS, 1983, 110 (02) : 149 - 164
[2] PLASMA-ACTIVATED HIGH-RATE ELECTRON-BEAM EVAPORATION FOR COATING METAL STRIPS
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[J]. MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1993, 163 (02): : 149 - 156
[3] COMPARISON BETWEEN ELECTRON-BEAM EVAPORATION AND HIGH-RATE SPUTTERING WITH A PLASMATRON
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[J]. THIN SOLID FILMS, 1977, 45 (02) : 385 - 385
[4] ELECTRON-BEAM EVAPORATION AND HIGH-RATE SPUTTERING WITH PLASMATRON - MAGNETRON SYSTEMS - COMPARISON
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[J]. VAKUUM-TECHNIK, 1978, 27 (02): : 51 - 55
[5] Novel in situ method for locating virtual source in high-rate electron-beam evaporation
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[J]. 1600, American Inst of Physics, Woodbury, NY, USA (65):
[6] CHARACTERIZATION OF GADOLINIUM PLASMA IN GADOLINIUM VAPOR AT HIGH-RATE EVAPORATION BY ELECTRON-BEAM HEATING
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[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1993, 32 (12A): : 5759 - 5764
[7] PLASMA-ACTIVATED HIGH-RATE ELECTRON-BEAM EVAPORATION USING A SPOTLESS CATHODIC ARC
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[J]. SURFACE & COATINGS TECHNOLOGY, 1994, 68 : 799 - 803
[8] NOVEL IN-SITU METHOD FOR LOCATING VIRTUAL SOURCE IN HIGH-RATE ELECTRON-BEAM EVAPORATION
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[J]. APPLIED PHYSICS LETTERS, 1994, 65 (02) : 251 - 253
[9] ELECTRON-BEAM LINE EVAPORATORS FOR ROLL COATING
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[J]. METAL FINISHING, 1985, 83 (03) : 79 - 83
[10] ELECTRON-BEAM EVAPORATION AND HIGH-RATE SPUTTERING WITH PLASMATRON-MAGNETRON SYSTEMS - COMPARISON .2.
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