COMPARISON BETWEEN ELECTRON-BEAM EVAPORATION AND HIGH-RATE SPUTTERING WITH A PLASMATRON

被引：0

作者：

SCHILLER, S ^{[1
]}

HEISIG, U ^{[1
]}

GOEDICKE, K ^{[1
]}

JAESCH, G ^{[1
]}

机构：

[1] MANFRED VONARDENNE RES INST,DRESDEN,GER DEM REP

来源：

THIN SOLID FILMS | 1977年 / 45卷 / 02期

关键词：

D O I：

10.1016/0040-6090(77)90274-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：385 / 385

页数：1

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