COPPER-BASE MATERIALS FORMED BY HIGH-RATE SPUTTERING

被引：1
|
作者：
BUSCH, R [1 ]
MCCLANAHAN, ED [1 ]
机构：
[1] BATTELLE MEM INST,PACIF NW LABS,RICHLAND,WA 99352
来源：
THIN SOLID FILMS | 1977年 / 45卷 / 02期
关键词：
D O I：
10.1016/0040-6090(77)90275-9
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：386 / 386
页数：1
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