PLASMA-ETCHING OF OXYGEN CONTAINING TITANIUM SILICIDE FILMS

被引:7
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作者
ROBB, FY
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D O I
10.1149/1.2115440
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:2906 / 2911
页数:6
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