GAS PLASMA-ETCHING OF CHROMIUM FILMS

被引：4

|

作者：

SUZUKI, Y

YAMAZAKI, T

NAKATA, H

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1982年 / 21卷 / 09期

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D O I：

10.1143/JJAP.21.1328

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：1328 / 1332

页数：5

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