THE ROLE OF A PHOTORESIST FILM ON REVERSE GAS PLASMA-ETCHING OF CHROMIUM FILMS

被引：6

作者：

YAMAZAKI, T

SUZUKI, Y

UNO, J

NAKATA, H

机构：

来源：

关键词：

D O I：

10.1143/JJAP.19.1371

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1371 / 1376

页数：6

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YAMAZAKI, T
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[2] GAS PLASMA-ETCHING OF CHROMIUM FILMS
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YAMAZAKI, T
NAKATA, H
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1982, 21 (09): : 1328 - 1332
[3] GAS PLASMA-ETCHING OF ION-IMPLANTED CHROMIUM FILMS
YAMAZAKI, T
SUZUKI, Y
NAKATA, H
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (06): : 1348 - 1350
[4] EFFECT OF PHOTORESIST ON PLASMA-ETCHING
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[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (11) : C624 - C625
[5] EFFECT OF PHOTORESIST ON PLASMA-ETCHING
TSOU, LY
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1989, 136 (08) : 2354 - 2356
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ABE, H
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (06): : 1351 - 1357
[7] PLANAR PLASMA-ETCHING OF CHROMIUM
NAGUIB, HM
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POLEY, HJ
[J]. VACUUM, 1983, 33 (05) : 285 - 290
[8] PHOTORESIST RETICULATION PROBLEMS ASSOCIATED WITH PLASMA-ETCHING
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[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1988, 135 (03) : C128 - C128
[9] PLASMA-ETCHING OF SILYLATED PHOTORESIST - A STUDY OF MECHANISMS
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PONS, M
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (01): : 26 - 31
[10] FILM DEPOSITION IN PLASMA-ETCHING
POLL, HU
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[J]. THIN SOLID FILMS, 1984, 112 (04) : 369 - 380