THE ROLE OF A PHOTORESIST FILM ON REVERSE GAS PLASMA-ETCHING OF CHROMIUM FILMS

被引：6

|

作者：

YAMAZAKI, T

SUZUKI, Y

UNO, J

NAKATA, H

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1980年 / 19卷 / 07期

关键词：

D O I：

10.1143/JJAP.19.1371

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：1371 / 1376

页数：6

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