EFFECT OF PHOTORESIST ON PLASMA-ETCHING

被引：0

|

作者：

TSOU, LY ^{[1
]}

机构：

[1] PHILIPS LABS,BRIARCLIFF MANOR,NY 10510

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1987年 / 134卷 / 11期

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：C624 / C625

页数：2

相关论文

共 50 条

[1] EFFECT OF PHOTORESIST ON PLASMA-ETCHING
TSOU, LY
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1989, 136 (08) : 2354 - 2356
[2] PHOTORESIST RETICULATION PROBLEMS ASSOCIATED WITH PLASMA-ETCHING
HACKENBERG, J
HOLBROOK, B
INGWERSEN, T
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1988, 135 (03) : C128 - C128
[3] PLASMA-ETCHING OF SILYLATED PHOTORESIST - A STUDY OF MECHANISMS
JOUBERT, O
PONS, M
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (01): : 26 - 31
[4] ELECTRON-CYCLOTRON RESONANCE PLASMA-ETCHING OF PHOTORESIST AT CRYOGENIC TEMPERATURES
VARHUE, W
BURROUGHS, J
MLYNKO, W
[J]. JOURNAL OF APPLIED PHYSICS, 1992, 72 (07) : 3050 - 3057
[5] THE ROLE OF A PHOTORESIST FILM ON REVERSE GAS PLASMA-ETCHING OF CHROMIUM FILMS
YAMAZAKI, T
SUZUKI, Y
UNO, J
NAKATA, H
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 (07) : 1371 - 1376
[6] PLASMA-ETCHING
MUCHA, JA
HESS, DW
[J]. ACS SYMPOSIUM SERIES, 1983, 219 : 215 - 285
[7] PLASMA-ETCHING OF ALUMINUM
HESS, DW
[J]. SOLID STATE TECHNOLOGY, 1981, 24 (04) : 189 - 194
[8] A MODEL FOR PLASMA-ETCHING
PETIT, B
PELLETIER, J
[J]. COMPTES RENDUS DE L ACADEMIE DES SCIENCES SERIE II, 1986, 302 (03): : 121 - 124
[9] PLASMA-ETCHING OF SIPOS
NELSON, RD
HENNING, SM
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (06) : C241 - C241
[10] ADVANCES IN PLASMA-ETCHING
FLAMM, DL
[J]. SOLID STATE TECHNOLOGY, 1991, 34 (04) : 105 - 105

← 1 2 3 4 5 →