THE ROLE OF A PHOTORESIST FILM ON REVERSE GAS PLASMA-ETCHING OF CHROMIUM FILMS

被引：6
|
作者：
YAMAZAKI, T
SUZUKI, Y
UNO, J
NAKATA, H
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 1980年 / 19卷 / 07期
关键词：
D O I：
10.1143/JJAP.19.1371
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1371 / 1376
页数：6
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