MECHANISM OF OXYGEN PLASMA-ETCHING OF POLYDIMETHYL SILOXANE FILMS

被引：62
|
作者：
CHOU, NJ
TANG, CH
PARASZCZAK, J
BABICH, E
机构：
来源：
APPLIED PHYSICS LETTERS | 1985年 / 46卷 / 01期
关键词：
D O I：
10.1063/1.95839
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
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页码：31 / 33
页数：3
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