PLASMA-ETCHING IN A MULTIPOLAR DISCHARGE

被引：50

作者：

WICKER, TE ^{[1
]}

MANTEI, TD ^{[1
]}

机构：

[1] UNIV CINCINNATI,DEPT ELECT & COMP ENGN,CINCINNATI,OH 45221

来源：

关键词：

D O I：

10.1063/1.334484

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1638 / 1647

页数：10

共 50 条

[1] MAGNETICALLY CONFINED DISCHARGE FOR PLASMA-ETCHING
MANTEI, TD
WICKER, T
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (03) : C82 - C82
[2] PLASMA-ETCHING IN MAGNETIC MULTIPOLE MICROWAVE-DISCHARGE
ARNAL, Y
PELLETIER, J
POMOT, C
PETIT, B
DURANDET, A
[J]. APPLIED PHYSICS LETTERS, 1984, 45 (02) : 132 - 134
[3] PLASMA-ETCHING
MUCHA, JA
HESS, DW
[J]. ACS SYMPOSIUM SERIES, 1983, 219 : 215 - 285
[4] PLASMA-ETCHING OF ALUMINUM
HESS, DW
[J]. SOLID STATE TECHNOLOGY, 1981, 24 (04) : 189 - 194
[5] ADVANCES IN PLASMA-ETCHING
FLAMM, DL
[J]. SOLID STATE TECHNOLOGY, 1991, 34 (04) : 105 - 105
[6] PLASMA-ETCHING OF SIPOS
NELSON, RD
HENNING, SM
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (06) : C241 - C241
[7] A MODEL FOR PLASMA-ETCHING
PETIT, B
PELLETIER, J
[J]. COMPTES RENDUS DE L ACADEMIE DES SCIENCES SERIE II, 1986, 302 (03): : 121 - 124
[8] PLASMA-ETCHING OF SIALON
CHATFIELD, C
NORSTROM, H
[J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1983, 66 (09) : C168 - C168
[9] MICROWAVE PLASMA-ETCHING
SUZUKI, K
NINOMIYA, K
NISHIMATSU, S
[J]. VACUUM, 1984, 34 (10-1) : 953 - 957
[10] THE PHYSICS OF PLASMA-ETCHING
ULACIA, JI
SCHWARZL, S
[J]. PHYSICA SCRIPTA, 1991, T35 : 299 - 308