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- [5] THE KINETICS AND MECHANISM OF THE ELECTROCHEMICAL FORMATION OF POROUS SURFACE-LAYERS ON SILICON IN HYDROFLUORIC-ACID - PHOTOELECTROCHEMICAL BEHAVIOR OF NORMAL-TYPE SILICON DURING ANODIC FORMATION OF THE POROUS LAYERS SOVIET ELECTROCHEMISTRY, 1986, 22 (03): : 313 - 319
- [6] KINETICS AND MECHANISM OF THE ELECTROCHEMICAL FORMATION OF POROUS SURFACE LAYERS ON SILICON IN HYDROFLUORIC ACID. PHOTOELECTROCHEMICAL BEHAVIOR OF n-TYPE SILICON DURING ANODIC FORMATION OF THE POROUS LAYERS. Soviet electrochemistry, 1986, 23 (03): : 313 - 319
- [7] EFFECT OF HYDROFLUORIC-ACID CONCENTRATION ON THE STRUCTURE AND KINETICS OF ELECTROCHEMICAL FORMATION OF THE POROUS LAYER ON N-TYPE SILICON UNDER STEADY ILLUMINATION SOVIET ELECTROCHEMISTRY, 1987, 23 (11): : 1445 - 1452
- [8] ANOMALOUSLY HIGH PHOTOVOLTAIC ACTIVITY OF POLISHED N-TYPE SILICON DURING ANODIC POROUS-LAYER FORMATION IN HYDROFLUORIC-ACID SOLUTIONS SOVIET ELECTROCHEMISTRY, 1987, 23 (11): : 1452 - 1457
- [9] ROLE OF THE SURFACE CONDITION IN THE MECHANISM OF MACROPORE NUCLEATION AND GROWTH DURING ELECTROCHEMICAL FORMATION OF THE POROUS LAYER ON N-TYPE SILICON IN CONCENTRATED HYDROFLUORIC-ACID IN THE DARK SOVIET ELECTROCHEMISTRY, 1987, 23 (12): : 1499 - 1505
- [10] Effect of hydrofluoric acid concentration on the structure and kinetics of electrochemical formation of the porous layer on n-type silicon under steady illumination Soviet electrochemistry, 1988, 23 (11): : 1445 - 1452